Effect of PECVD SiNx Deposition Parameters on Efficiency of Monocrystalline Silicon Solar Cells |
Paper ID : 1167-ICRSSSA |
Authors |
Doaa Mohammedd El Kady *1, Aref Eliwa2, Mohamed Zahran3, Gaber elsaady ahmed4, El-Nobi Ibrahim5 1The Joint National Egyptian-Chinese Renewable Energy laboratory affiliated to the Academy of Scientific Research and Technology , Sohag 2Photovoltaic Cells Department, Electronics Research Institute, Cairo, Egypt Electrical Engineering Department, Faculty of Engineering, October 6 University, Egypt 3Photovoltaic Cells Department, Electronics Research Institute, Cairo, Egypt National Authority of Remote Sensing and Space Science “NARSS”, Cairo, Egypt 4Electrical Engineering Department, Faculty of Engineering, Assiut University, Egyp 5Electrical Engineering Department, Faculty of Engineering, Assiut University, Egypt |
Abstract |
This study focus on the optimization of PECVD SiNx deposition parameters for monocrystalline silicon solar cells anti-reflection coating to reduce the optical loss and enhances the cells performance. SiNx films were prepared using a gas mixture of high-purity silane (SiH4) and ammonia ( NH3 ). The effect of deposition parameters of SiNX film such as SiH4 / NH3 gas flow ratio on the film thickness, refractive index, reflectance and morphology of the SiNX samples was investigated. SiNx films was prepared at a deposition temperature of 380°C, deposition time of 11 min., deposition pressure of 195 Pa, plasma power was set at 3100 W and the SiH4 / NH3 gas flow ratio was varied from 7 to 9. We explored the effect of change gas flow ratio of SiNX film on the efficiency of monocrystalline silicon solar cells. The optimal flow ratio equal 9. The efficiency (Eff ) of solar cell was 18.84 %., the short-circuited current (ISC) of 8.96 A, open-circuit voltage (VOC ) of 0.633 V and fill factor ( FF ) of 80.09% are the best parameters of the silicon solar cell at the optimal deposition conditions. This work was carried out in the Joint National Egyptian-Chinese Renewable Energy laboratory, Sohag, Egypt. |
Keywords |
Anti-reflection coatings; monocrystalline silicon solar cells;silicon nitride, PECVD |
Status: Accepted (Oral Presentation) |